Laser lithography

Micro Pattern Generator µPG 101

The Micro Pattern Generator MikroPG 101 is a direct-writing laser lithography system for the maskless exposure of UV-activated photoresists. It is well suited for work on a laboratory scale, for one-off productions and very small series.

Important facts summarized:

  • In the present configuration (Write Mode II), the minimum structure size is 1 µm.
  • Different materials (glass, silicon, diamond ...) can be used as substrates.
  • Both positive (i.e. the exposed regions are removed) and negative resists (the exposed regions remain) can be used as photoresist (resist). Exposure is followed by development, in which the unwanted material is removed in a wet-chemical process step (using a solvent).
  • Convenient input of designs via CAD and Windows PC
  • Real-time autofocus system (always keeps the substrate in the focus of the writing beam)
    • Pneumatic autofocus (robust)
    • Second, alternative autofocus: optical, with red laser (less reaction, less robust)
  • Integrated camera system (for aligning and examining exposures)
  • Exposure by a diode laser with 375 nm wavelength (UV) and maximum power 70 mW.
  • Position measurement accuracy of up to 200nm
  • x,y stage with multi-zone vacuum chuck for different substrate sizes, air bearings, linear motor and linear encoders with a resolution of 20nm
  • Substrate sizes up to 150x150 mm², maximum substrate thickness of 6mm
  • Exposure area up to 125x125 mm²
  • Exposures possible in raster or vector mode