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TU-Clausthal Centre for Material Technology

Coating technology

PVD system

CemeCon CC800/9 Custom

General:

Manufacturer: CemeCon AG

  • PVD coating system for reactive or non-reactive sputtering processes
  • equipped with six "unbalanced magnetron" evaporators
  • Production of multilayer and nanolayer structures in a single operation with different target materials
  • Production of hard material layers such as TiN, TiB2, ZrN, TiCN by introducing reactive process gases

Technical data:

Coating chamber: 800 mm x 800 mm x 1,000 mm (length x width x height)

Number of cathodes: 6

Cathode size (target): 500 mm x 88 mm

Cathode power: 8 KW

Heating output: Front and rear heating max. 8.8 kW; center heating max. 15 kW

Operating modes: 4 cathodes: DC mode / pulsed MF mode,

2 cathodes HPPMS (high power pulsed magnetron sputtering)

Substrate table: Ø 400 mm with six planetary drives Ø 130 mm

Bias substrate table up to 1200V

Pumps: 2 turbopumps; 1 rotary vane pump

Gases: Argon, nitrogen, acetylene, krypton, oxygen

PPA coating system

Plasma powder system from Hettiger

Energy source: transmitted electric arc

Filler material forms: Powder/powder mixtures, two-powder technology possible

Areas of application: local and large-area hardfacing of new parts, repair welding

Process-specific advantages: high hard material content can be achieved, high coating performance, all powdered alloys can be processed, low mixing and little reworking

Max. Max.currents: 600 A for the main arc, 200 A for the pilot arc

Max. Feed speed: 500 mm/min